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Effect of corona pre-treatment on the performance of gas barrier layers applied by atomic layer deposition onto polymer-coated paperboard

机译:电晕预处理对原子层沉积在聚合物涂层纸板上的阻气层性能的影响

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The effect of corona pre-treatment on the performance of Al_2O_3 and SiO_2 gas barrier layers applied by atomic layer deposition onto polymer-coated paperboards was studied. Both polyethylene and polylac-tide coated paperboards were corona treated prior to ALD. Corona treatment increased surface energies of the paperboard substrates, and this effect was still observed after several days. Al_2O_3 and SiO_2 films were grown on top of the polymer coatings at temperature of 100℃ using the atomic layer deposition (ALD) technique. For SiO_2 depositions a new precursor, bis(diethylamido) silane, was used. The positive effect of the corona pre-treatment on the barrier properties of the polymer-coated paperboards with the ALD-grown layers was more significant with polyethylene coated paperboard and with thin deposited layers (shorter ALD process). SiO_2 performed similarly to Al_2O_3 with the PE coated board when it comes to the oxygen barrier, while the performance of SiO_2 with the biopolymer-coated board was more moderate. The effect of corona pre-treatment was negligible or even negative with the biopolymer-coated board. The ALD film growth and the effect of corona treatment on different substrates require further investigation.
机译:研究了电晕预处理对通过原子层沉积在聚合物涂层纸板上施加的Al_2O_3和SiO_2气体阻隔层性能的影响。在ALD之前,对聚乙烯和聚乳酸涂层的纸板都进行了电晕处理。电晕处理增加了纸板基材的表面能,几天后仍然观察到这种效果。采用原子层沉积(ALD)技术在100℃的温度下在聚合物涂层上生长Al_2O_3和SiO_2薄膜。对于SiO_2沉积,使用了一种新的前体双(二乙基氨基)硅烷。电晕预处理对带有ALD增长层的聚合物涂层纸板的阻隔性能的积极影响在聚乙烯涂覆的纸板和较薄的沉积层中更为明显(ALD工艺更短)。当涉及到氧气阻隔层时,SiO_2的表现与PE涂层板的Al_2O_3相似,而SiO_2的生物聚合物涂层板的性能更适中。用生物聚合物涂层的板,电晕预处理的效果可忽略不计甚至是负面的。 ALD膜的生长以及电晕处理对不同基材的影响需要进一步研究。

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