Growth research of Sn nanoparticles deposited on Si(001) substrate by solid phase epitaxy

摘要

High density of Sn nanoparticles (NPs) had been obtained directly on Si(001) substrate by solid phase epitaxy. The dependence of the morphology and crystallinity of Sn NPs on Sn coverage, annealing temperature and annealing time was investigated by atomic force microscope (AFM) and X-ray diffraction (XRD). Uniform and densely packed (～10~(10) cm~(-2)) Sn NPs were obtained at low Sn coverage, low annealing temperature and short annealing time, respectively. The XRD results showed that, the formed Sn NPs were in the form of crystalline β-Sn, with a distinct orientation of Sn(110)//Si(001). The nucleation activation energy of Sn adatoms on Si(001) surface was estimated to be 0.41 ± 0.05 eV.