Simplified method to prepare atomically-ordered TiO_2(110)-(l × 1) surfaces with steps and terraces

摘要

An effective way to prepare atomically-ordered rutile TiO_2(110) surfaces that have distinct step and terrace structures suitable for oxide thin film deposition is demonstrated. Only a two-step procedure, consisting of 20% HF etching and UHV-annealing at 1100℃, was required to yield a clean (1×1) structure with step and terrace structures. Investigation of the surface using scanning tunneling microscopy, low-energy electron diffraction, and Auger electron spectroscopy reveals that carbon contamination is removed at around 800℃, and straight steps with clear terraces appear at around 1000℃.