机译:在4°离轴衬底上生长具有低表面粗糙度和形态缺陷密度的4H-SiC外延层
Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China,Tianyu Semiconductor Technology Co., Ltd, Dongguan 523000, China;
Tianyu Semiconductor Technology Co., Ltd, Dongguan 523000, China;
Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
Tianyu Semiconductor Technology Co., Ltd, Dongguan 523000, China;
Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
4H-SiC; 4° off-axis; surface roughness; morphological defects; etching; epitaxial growth;
机译:通过在4°离轴4H-SiC衬底表面穿入具有形态特征的螺钉位错来形成外延缺陷
机译:使用氯化物基CVD在4°离轴基体上以非常高的生长速率生长光滑的4H-SiC外延层
机译:在4°离轴(0001)和(000-1)衬底上生长的4H-SiC外延层中缺陷的比较研究
机译:改善4°离轴衬底上生长的4H-SiC外延层的表面粗糙度
机译:在4H和6H碳化硅衬底上生长的砷化硼外延层的生长机理和缺陷结构。
机译:低压对4H-SiC外延层表面粗糙度和形貌缺陷的影响
机译:Ge介导的低轴4H-SiC衬底上双自由3C-SiC成核和生长的表面制备
机译:新型碳化钽(TaC)衬底上低缺陷密度氮化镓(GaN)薄膜的生长,提高器件性能