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Effect of dry oxidation on the energy gap and chemical composition of CVD graphene on nickel

机译:干氧化对镍上CVD石墨烯的能隙和化学组成的影响

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摘要

The findings presented herein show that the electronic properties of CVD graphene on nickel can be altered from metallic to semiconducting by introducing oxygen adsorbates via UV/ozone or oxygen plasma treatment. These properties can be partially recovered by removing the oxygen adsorbates via vacuum annealing treatment. The effect of oxidation is studied by scanning tunneling microscopy/spectroscopy (STM/STS) and X-ray photoelectron spectroscopy (XPS). As probed by STM/STS, an energy gap opening of 0.11-0.15 eV is obtainable as the oxygen/carbon atomic ratio reaches 13-16%. The corresponding XPS spectra show a significant monotonic increase in the concentration of oxygenated functional groups due to the oxidation treatments. This study demonstrates that the opening of energy gap in CVD graphene can be reasonably controlled by a combination of UV/ozone or oxygen plasma treatment and vacuum annealing treatment.
机译:本文提出的发现表明,通过经由UV /臭氧或氧等离子体处理引入氧吸附物,可以将CVD石墨烯在镍上的电子性质从金属变为半导体。通过经由真空退火处理去除氧吸附物,可以部分地恢复这些性质。通过扫描隧道显微镜/光谱学(STM / STS)和X射线光电子能谱(XPS)研究了氧化作用。如STM / STS所示,当氧/碳原子比达到13-16%时,能隙开口为0.11-0.15 eV。相应的XPS光谱显示由于氧化处理,氧化官能团的浓度显着单调增加。这项研究表明,通过将UV /臭氧或氧等离子体处理与真空退火处理相结合,可以合理地控制CVD石墨烯中的能隙开口。

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