机译:用光致抗蚀剂掩模在Cl-2 / Ar,Cl-2 / Ar / O-2化学中对GaAs进行电感耦合等离子体刻蚀
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;
GaAs; Inductively coupled plasma etching; Cl-2; O-2; Etching rate ratio;
机译:使用感应耦合的Cl-2 / Ar和BCl3 / Cl-2 / Ar等离子体对(Ba,Sr)TiO3薄膜进行等离子体蚀刻
机译:Ar,Ar / O-2和Ar / O-2 / Cl-2电感耦合等离子体的模型和实验比较
机译:Ar,Ar / O-2和Ar / O-2 / Cl-2电感耦合等离子体的模型和实验比较
机译:用光致抗蚀剂掩模在Cl2 / Ar / O2化学中对GaAs进行电感耦合等离子体刻蚀
机译:使用电感耦合等离子体质谱法分析砷,镉,铅和汞浓度的砷,镉,铅和汞的浓度=使用光谱法分析大麻油中的砷,镉,铅和汞浓度
机译:不同氟基混合气体使用电感耦合等离子体干法刻蚀钛酸钡薄膜的比较分析
机译:高密度BCL3和BCL3 / AR中的GaAs和Algaas半导体材料的干蚀刻电感耦合等离子体
机译:Cl(2)-ar混合物电感耦合等离子体中Gaas及相关化合物的反应离子束蚀刻;真空科学与技术学报B