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Microstructure and characterization of a novel cobalt coating prepared by cathode plasma electrolytic deposition

机译:阴极等离子体电解沉积制备新型钴涂层的组织与表征

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A novel cobalt coating was prepared by cathode plasma electrolytic deposition (CPED). The kinetics of the electrode process in cathode plasma electrolytic deposition was studied. The composition and microstructure of the deposited coatings were investigated by SEM, EDS, XRD and TEM. The novel cobalt coatings were dense and uniform, showing a typically molten morphology, and were deposited with a rather fast rate. Different from the coatings prepared by conventional electrodeposition or chemical plating, pure cobalt coatings with face center cubic (fcc) structure were obtained by CPED. The deposited coatings were nanocrystalline structure with an average grain size of 40-50 nm, exhibited high hardness, excellent adhesion with the stainless steels, and superior wear resistance. The properties of the novel cobalt coatings prepared by CPED have been improved significantly, as compared with that prepared by conventional methods. It reveals that cathode plasma electrolytic deposition is an effective way to prepare novel cobalt coatings with high quality. (C) 2015 Elsevier B.V. All rights reserved.
机译:通过阴极等离子体电解沉积(CPED)制备了新型钴涂层。研究了阴极等离子体电解沉积中电极过程的动力学。通过SEM,EDS,XRD和TEM研究了沉积涂层的组成和微观结构。新型钴涂层致密且均匀,显示出典型的熔融形态,并且以相当快的速率沉积。与通过常规电沉积或化学镀制备的涂层不同,通过CPED获得了具有面心立方(fcc)结构的纯钴涂层。沉积的涂层是平均晶粒尺寸为40-50 nm的纳米晶体结构,具有高硬度,与不锈钢的优异粘合性和优异的耐磨性。与通过常规方法制备的钴涂层相比,通过CPED制备的新型钴涂层的性能已得到显着改善。结果表明,阴极等离子体电解沉积是制备高质量新型钴涂层的有效途径。 (C)2015 Elsevier B.V.保留所有权利。

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