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The intriguing electronic and optical properties modulation of hydrogen and fluorine codecorated silicene layers

机译:氢和氟共配硅层有趣的电子和光学性质调制

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摘要

First-principles calculations based on density-functional theory reveal some superior physical properties of hydrogen and fluorine co-decorated silicene (HSiF) monolayer and bilayer. Our simulated results reveal that the HSiF monolayer is a large direct band gap semiconductor greatly differing from the gap less semi-metallic silicene. There exists strong interlayer coupling in HSiF bilayer, leading to the good stabilities of HSiF bilayer even beyond bilayer graphene. The proposed HSiF bilayer exhibits a moderate direct band gap of 0.296 eV which is much lower than that of HSiF monolayer. Encouragingly, HSiF layers all have a direct band gap nature, irrespective of stacking pattern, thickness and external electric fields, which is an advantage over MoS2 layers. Furthermore, an out-of-plane electric field has an evident impact on the band structures of the HSiF monolayer and bilayer. Especially, the band gap of HSiF bilayer can be effectively tuned by external electric field, even a semiconductor-metal transition occurs. More importantly, the HSiF bilayer exhibits a significant improved visible light adsorption peak with respect to that of HSiF monolayer, and the superior optical properties is robust, independent of stacking pattern. The complete electron-hole separation also enhances the photocatalytic efficiency of HSiF bilayer. In a word, the moderate band gap, effective band gap modification by external electric field, robust direct band gap nature, suitable band edge positions, electron-hole separation, and fascinating visible light adsorption, which enable HSiF bilayer to have great potential applications in the field of solar energy conversion, high performance photocatalysis and nanoelectronic devices, and we call for more concern over this kind of 2D Janus materials which possesses excellent properties. (C) 2016 Elsevier B.V. All rights reserved.
机译:基于密度泛函理论的第一性原理计算揭示了氢和氟共装饰硅(HSiF)单层和双层的某些优越的物理性能。我们的模拟结果表明,HSiF单层是一种大型的直接带隙半导体,与无间隙的半金属硅截然不同。 HSiF双层中存在牢固的层间耦合,从而导致HSiF双层甚至在双层石墨烯之外也具有良好的稳定性。拟议的HSiF双层膜表现出0.296 eV的中等直接带隙,远低于HSiF单层膜。令人鼓舞的是,无论堆叠图案,厚度和外部电场如何,HSiF层都具有直接的带隙性质,这比MoS2层更具优势。此外,平面外电场对HSiF单层和双层的能带结构有明显影响。特别地,即使发生半导体-金属跃迁,也可以通过外部电场有效地调节HSiF双层的带隙。更重要的是,相对于HSiF单分子膜,HSiF双层膜具有明显改善的可见光吸收峰,并且卓越的光学性能很稳定,与堆叠模式无关。完全的电子-空穴分离还增强了HSiF双层的光催化效率。总之,适度的带隙,外部电场对带隙的有效调节,强大的直接带隙性质,合适的能带边缘位置,电子-空穴分离以及引人入胜的可见光吸附力,这些使得HSiF双层在半导体中具有广阔的应用前景。在太阳能转换,高性能光催化和纳米电子器件领域,我们呼吁人们对这种具有优异性能的二维Janus材料给予更多关注。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2017年第15期|73-80|共8页
  • 作者单位

    Guilin Univ Elect Technol, Fac Mech & Elect Engn, Guilin 541004, Peoples R China|Chongqing Univ, Educ Minist China, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China|Chongqing Univ, Coll Optoelect Engn, Chongqing 400044, Peoples R China;

    Guilin Univ Elect Technol, Fac Mech & Elect Engn, Guilin 541004, Peoples R China|Chongqing Univ, Educ Minist China, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China|Chongqing Univ, Coll Optoelect Engn, Chongqing 400044, Peoples R China;

    Chongqing Univ, Educ Minist China, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China|Chongqing Univ, Coll Optoelect Engn, Chongqing 400044, Peoples R China;

    Chongqing Univ, Educ Minist China, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China|Chongqing Univ, Coll Optoelect Engn, Chongqing 400044, Peoples R China;

    Chongqing Univ, Educ Minist China, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China|Chongqing Univ, Coll Optoelect Engn, Chongqing 400044, Peoples R China;

    Chongqing Univ, Educ Minist China, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China|Chongqing Univ, Coll Optoelect Engn, Chongqing 400044, Peoples R China;

    Guilin Univ Elect Technol, Fac Mech & Elect Engn, Guilin 541004, Peoples R China;

    Guilin Univ Elect Technol, Fac Mech & Elect Engn, Guilin 541004, Peoples R China|Chongqing Univ, Educ Minist China, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China|Chongqing Univ, Coll Optoelect Engn, Chongqing 400044, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Density-functional theory; Photocatalysis; Solar energy conversion; Nanoelectronic devices;

    机译:密度泛函理论;光催化;太阳能转化;纳米电子器件;

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