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首页> 外文期刊>Applied Surface Science >Effect of SiO2 addition on photocatalytic activity, water contact angle and mechanical stability of visible light activated TiO2 thin films applied on stainless steel by a sol gel method
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Effect of SiO2 addition on photocatalytic activity, water contact angle and mechanical stability of visible light activated TiO2 thin films applied on stainless steel by a sol gel method

机译:SiO2添加对溶胶-凝胶法在不锈钢上涂覆可见光活化TiO2薄膜的光催化活性,水接触角和机械稳定性的影响

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摘要

Nanostructured N doped TiO2/20%SiO2 thin films were developed on steel surface via sol gel method using a painting airbrush. Thin films then were calcined at various temperatures in a range of 400-600 degrees C. The effect of SiO2 addition on phase composition and microstructural evolution of N doped TiO2 films were studied using XRD and FESEM. Optical properties, visible light photocatalytic activity, hydrophilic behavior, and mechanical behavior of the films were also investigated by DRS, methylene blue degradation, water contact angle measurements, and nanoscratch testing. Results indicated that the band gap energy of N doped TiO2/SiO2 was increased from 2.93 to 3.09 eV. Crack formation during calcination was also significantly promoted in the composite films. All composite films demonstrated weaker visible light photocatalytic activities and lower mechanical stability in comparison with N doped TiO2 films. Moreover, the N doped TiO2/SiO2 film calcined at 600 degrees C showed undesirable hydrophilic behavior with a water contact angle of 57 degrees after 31 h of visible light irradiation. Outcomes of the present study reveal some different results to previous reports on TiO2/SiO2 films. In general, we believe the differences in substrate material as well as application in visible light are the main reasons for the above mentioned contradiction. (C) 2016 Elsevier B.V. All rights reserved.
机译:使用喷枪通过溶胶凝胶法在钢表面形成了纳米结构的N掺杂的TiO2 / 20%SiO2薄膜。然后将薄膜在400-600摄氏度范围内的不同温度下煅烧。使用XRD和FESEM研究了SiO2添加对N掺杂TiO2薄膜的相组成和微观结构演变的影响。还通过DRS,亚甲基蓝降解,水接触角测量和纳米划痕测试研究了膜的光学性质,可见光光催化活性,亲水行为和机械行为。结果表明,N掺杂的TiO2 / SiO2的带隙能从2.93增加到3.09eV。复合膜中煅烧过程中的裂纹形成也得到明显促进。与N掺杂的TiO2薄膜相比,所有复合薄膜均表现出较弱的可见光光催化活性和较低的机械稳定性。而且,在可见光照射31小时后,在600℃下煅烧的N掺杂的TiO 2 / SiO 2膜表现出不希望的亲水行为,水接触角为57度。本研究的结果揭示了与以前关于TiO2 / SiO2薄膜的报道不同的结果。通常,我们认为基板材料的差异以及可见光的应用是上述矛盾的主要原因。 (C)2016 Elsevier B.V.保留所有权利。

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