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Thin films of AlCrFeCoNiCu high-entropy alloy by pulsed laser deposition

机译:脉冲激光沉积AlCrFeCoNiCu高熵合金薄膜

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摘要

Pulsed laser deposition has been used to prepare thin films of the high entropy alloy AlCrFeCoNiCu. The 35 nm films were deposited in ultra-high vacuum onto glass at room temperature and above and analysed using X-ray diffraction and X-ray photoelectron spectroscopy. Films deposited at room temperature exhibit a mix of FCC and BCC reflections, the FCC crystallites having size similar to the film thickness, but the BCC crystallites are larger. The intensity of the reflections from both crystal structures reduce with increasing deposition temperature, the fall in BCC commencing at lower temperature than the FCC associated with a reduction of the content of Al and Cu. X-ray photoelectron spectroscopy shows that the films deposited at room temperature are closer to stoichiometry than those at higher temperatures. An important feature of the X-ray photoelectron spectroscopy depth profiles is surface segregation, the outer 3 nm of the high entropy alloy films has higher concentration of Al and, to a lesser extent, Cr.
机译:脉冲激光沉积已被用于制备高熵合金AlCrFeCoNiCu的薄膜。在室温及高于室温的条件下,将35 nm薄膜以超高真空沉积在玻璃上,并使用X射线衍射和X射线光电子能谱进行分析。在室温下沉积的膜表现出FCC和BCC反射的混合,FCC微晶的大小与膜厚相似,但是BCC微晶更大。两种晶体结构的反射强度随沉积温度的升高而降低,BCC的降低始于比FCC更低的温度,这与Al和Cu含量的降低有关。 X射线光电子能谱显示,在室温下沉积的薄膜比在高温下沉积的薄膜更接近化学计量。 X射线光电子能谱深度分布图的一个重要特征是表面偏析,高熵合金膜的外部3 nm具有较高的Al浓度,较小程度的Cr。

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