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Enhanced photocatalytic performances of ultrafine g-C3N4 nanosheets obtained by gaseous stripping with wet nitrogen

机译:湿氮气气提法制得的超细g-C3N4纳米片的光催化性能增强

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摘要

Graphitic carbon nitride (g-C3N4) is a promising heterogeneous photocatalyst for organics pollutants degradation and water splitting. Herein, we highlight an available pathway to prepare the ultrafine g-C3N4 nanosheets by gaseous stripping of bulk g-C3N4 in wet nitrogen. As comparison, g-C3N4 treated in air and nitrogen atmospheres are also prepared. The obtained products are characterized with X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy and Fourier transform infrared spectra, respectively. Well dispersed g-C3N4 nanosheets can be obtained by this gaseous stripping process in wet nitrogen, which possess much higher specific surface area (211.2 m(2) g(-1)) than that of bulk g-C3N4 (15.3 m(2) g(-1)). Both RhB degradation and water splitting are applied to characterize the photocatalytic performances of the ultrafine g-C3N4 nanosheets. The g-C3N4 (w-N-2) nanosheets can degrade 20 mg/L RhB completely within 12 min under visible light illumination, which is 5.32 times faster than that of bulk g-C3N4. Also, the g-C3N4 (w-N-2) nanosheets possess the highest photocatalytic hydrogen evolution rate of 1113.48 mu mol h(-1) g(-1) under visible light illumination, which is 6 times that of bulk g-C3N4. The mechanisms of enhancing the photocatalytic performance are discussed to be the higher oxidation ability of VB and higher specific surface area (211.2 m(2)/g) of the ultrafine g-C3N4 nanosheets. (C) 2017 Elsevier B.V. All rights reserved.
机译:石墨碳氮化物(g-C3N4)是用于有机污染物降解和水分解的有前途的多相光催化剂。在本文中,我们重点介绍了通过湿氮中气态剥离大量g-C3N4制备超细g-C3N4纳米片的可行途径。作为比较,还制备了在空气和氮气气氛中处理过的g-C3N4。所得产物分别用X射线衍射,透射电子显微镜,X射线光电子能谱和傅立叶变换红外光谱表征。通过湿气中的气态汽提过程可以得到分散良好的g-C3N4纳米片,其比表面积(215.3 m(2)g(-1))比散装g-C3N4的比表面积(15.3 m(2))高得多。 g(-1))。 RhB降解和水分解均用于表征超细g-C3N4纳米片的光催化性能。 g-C3N4(w-N-2)纳米片在可见光照射下可在12分钟内完全降解20 mg / L RhB,这比块状g-C3N4快5.32倍。同样,在可见光照射下,g-C3N4(w-N-2)纳米片具有最高的光催化氢逸出速率1113.48μmol h(-1)g(-1),是整体g-C3N4的6倍。讨论的提高光催化性能的机制是VB的较高氧化能力和超细g-C3N4纳米片的较高比表面积(211.2 m(2)/ g)。 (C)2017 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2018年第ptaa期|730-738|共9页
  • 作者单位

    Hefei Univ Technol, Sch Mat Sci & Engn, Hefei 230009, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Mat Sci & Engn, Hefei 230009, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Mat Sci & Engn, Hefei 230009, Anhui, Peoples R China|Hefei Univ Technol, Key Lab Adv Funct Mat & Devices Anhui Prov, Hefei 230009, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Mat Sci & Engn, Hefei 230009, Anhui, Peoples R China|Hefei Univ Technol, Key Lab Adv Funct Mat & Devices Anhui Prov, Hefei 230009, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Mat Sci & Engn, Hefei 230009, Anhui, Peoples R China|Hefei Univ Technol, Key Lab Adv Funct Mat & Devices Anhui Prov, Hefei 230009, Anhui, Peoples R China;

    Hefei Univ Technol, Key Lab Adv Funct Mat & Devices Anhui Prov, Hefei 230009, Anhui, Peoples R China|Lab Nonferrous Met & Proc Engn Anhui Prov, Hefei 230009, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Mat Sci & Engn, Hefei 230009, Anhui, Peoples R China|Hefei Univ Technol, Key Lab Adv Funct Mat & Devices Anhui Prov, Hefei 230009, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Mat Sci & Engn, Hefei 230009, Anhui, Peoples R China|Hefei Univ Technol, Key Lab Adv Funct Mat & Devices Anhui Prov, Hefei 230009, Anhui, Peoples R China|Lab Nonferrous Met & Proc Engn Anhui Prov, Hefei 230009, Anhui, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    g-C3N4 nanosheets; Gaseous stripping; Wet nitrogen; Photocatalytic degradation; Hydrogen evolution;

    机译:g-C3N4纳米片;气相剥离;湿氮;光催化降解;析氢;
  • 入库时间 2022-08-18 03:04:38

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