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The progress made using the combustion chemical vapor deposition (CCVD) technique to fabricate YBa2Cu3O7-x coated conductors

机译:使用燃烧化学气相沉积(CCVD)技术制备YBa2Cu3O7-x涂层导体的研究进展

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摘要

Combustion Chemical Vapor Deposition (CCVD) is a nonvacuum technique being investigated, in conjunction with the Rolling Assisted Biaxially Textured Substrates (RABiTS?) process, as a method to fabricate low-cost, long-length Yttrium Barium Copper Oxide (YBCO) coated conductor tapes. This technique has been scaled to produce meter + lengths of buffer material with excellent epitaxial and microstructural uniformity along the length. Additional efforts focus on depositing YBCO on these lengths using several deposition techniques including CCVD. Pulsed laser deposition (PLD) YBCO with critical current densities >1 MA/cm2 have been achieved on short coupons taken from meter lengths of CeO2/STO/Ni architectures. CCVD buffer layers on Ni-W are still being optimized as YBCO critical current densities are less than 50,000 A/cm2. The critical current densities of coupons of YBCO deposited by CCVD onto CCVD buffered substrates is increasing up to 100,000 A/cm2, but further optimization is needed to yield high performance samples.
机译:燃烧化学气相沉积(CCVD)是一种非真空技术,正与滚动辅助双轴纹理化衬底(RABiTS?)工艺一起进行研究,作为一种制造低成本,长长度氧化钇钡铜氧化物(YBCO)涂层导体的方法磁带。此技术已按比例缩放以生产米级+长度的缓冲材料,该材料沿其长度具有出色的外延和微观结构均匀性。额外的工作集中在使用包括CCVD在内的几种沉积技术以这些长度沉积YBCO。临界电流密度> 1 MA / cm2的脉冲激光沉积(PLD)YBCO已通过从CeO2 / STO / Ni结构的仪表长度中获取的短试样获得。由于YBCO临界电流密度小于50,000 A / cm2,Ni-W上的CCVD缓冲层仍在优化中。通过CCVD沉积到CCVD缓冲的基板上的YBCO试样的临界电流密度正在增加,最高可达100,000 A / cm2,但是需要进一步优化以产生高性能样品。

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