Thin SiC_x layers prepared by hybrid laser-magnetron deposition

摘要

Thin SiC_x films were fabricated by hybrid laser-magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700℃. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400-1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions.