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Dc current transport behavior in amorphous GeSe films

机译:非晶态GeSe薄膜中的直流电流传输行为

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摘要

The dc electric conduction behavior of amorphous GeSe films sandwiched between the Pt bottom electrode and various counter electrodes (Pt, Cr, and Ti) was examined in a voltage as well as a time domain. The time domain investigation identified time-dependent resistance change and relaxation. The voltage domain analysis revealed that the current transport in these metal-insulator-metal junctions is probably attributed to bulk-limited band-conduction due to delocalized charge carriers.
机译:在电压和时域中检查了夹在Pt底部电极和各种对电极(Pt,Cr和Ti)之间的非晶GeSe膜的dc导电行为。时域研究确定了随时间变化的电阻变化和松弛。电压域分析表明,这些金属-绝缘体-金属结中的电流传输可能归因于电荷载流子的局域化,限制了体的带导。

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  • 来源
    《Applied Physics》 |2011年第4期|p.1027-1032|共6页
  • 作者单位

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Seongbuk-ku, Seoul 136-791, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Seongbuk-ku, Seoul 136-791, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Seongbuk-ku, Seoul 136-791, Republic of Korea,WCU Hybrid Materials Program, Department of Materials Science and Engineering, and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Republic of Korea;

    WCU Hybrid Materials Program, Department of Materials Science and Engineering, and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Seongbuk-ku, Seoul 136-791, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Seongbuk-ku, Seoul 136-791, Republic of Korea;

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