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Low thermal expansion behavior and transport properties of Ni and Ge co-doped manganese nitride materials at cryogenic temperatures

机译:Ni和Ge共掺杂的氮化锰材料在低温下的低热膨胀行为和传输性能

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摘要

A series of Ni and Ge co-doped manganese nitride materials were fabricated by mechanical ball milling followed by solid-state sintering. Their thermal expansion properties and electrical and thermal conductivities were investigated in the temperature range of 77–300 K. The results show that Ni and Ge co-doped manganese nitride materials have negative thermal expansion (NTE), and the operation-temperature window of NTE shifts toward the lower temperature region and the variation of linear thermal expansion (ΔL/L (300K)) in the operation-temperature window of NTE decreases with increasing Ni content. The combination of these two factors results in a low coefficient of thermal expansion (CTE) at cryogenic temperatures. The average CTE of Mn3(Cu0.2Ni0.4Ge0.4)N drops to ‘zero’ in the temperature range of 190–77 K. The values of electrical and thermal conductivities of the Ni and Ge co-doped manganese nitride materials are in the ranges of 2–3×103 (ohm cm)−1 and 1.6–3.4 W (m K)−1, respectively.
机译:通过机械球磨,然后进行固态烧结,制造了一系列Ni和Ge共掺杂的氮化锰材料。研究了它们在77–300 K的温度范围内的热膨胀特性以及电导率和热导率。结​​果表明,Ni和Ge共掺杂的氮化锰材料具有负热膨胀(NTE),并且NTE的工作温度窗口NTE的运行温度窗口中的线性热膨胀(ΔL/ L (300K))随Ni含量的增加而减小。这两个因素的组合导致低温下的热膨胀系数(CTE)低。 Mn 3 (Cu 0.2 Ni 0.4 Ge 0.4 )N的平均CTE降至'零'。 Ni和Ge共掺杂的氮化锰材料的电导率和热导率值在2–3×10 3 (ohm cm) -1 和1.6–3.4 W(m K) -1

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