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首页> 外文期刊>Applied Physics A: Materials Science & Processing >Dielectric properties of thin-film ZrO2 up to 50 GHz for RF MEMS switches
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Dielectric properties of thin-film ZrO2 up to 50 GHz for RF MEMS switches

机译:射频MEMS开关高达50 GHz的薄膜ZrO 2 的介电性能

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摘要

The dielectric properties of zirconium dioxide (ZrO2) ceramic thin films were characterized up to 50 GHz using coplanar waveguides (CPWs) and metal–insulator–metal (MIM) capacitors with top circular electrodes. The ZrO2 films were deposited using a chemical solution onto high-resistivity Si wafers and metal layers. The real part of the dielectric constant of approximately 22 and 26 was extracted at 50 GHz for CPW and MIM structures, respectively, and the loss tangent was approximately 0.09 at 50 GHz. C–V and I–V measurements were carried out to determine low-frequency and DC dielectric properties. The measurement results indicate that ZrO2 is a promising material to be used as a dielectric layer for radio-frequency (RF) microelectromechanical systems (MEMS) capacitive switches.
机译:使用共面波导(CPW)和带有顶部圆形电极的金属-绝缘体-金属(MIM)电容器,可表征高达50 GHz的二氧化锆(ZrO 2 )陶瓷薄膜的介电性能。使用化学溶液将ZrO 2 膜沉积到高电阻率的Si晶片和金属层上。对于CPW和MIM结构,分别在50 GHz处提取出约22和26的介电常数的实部,而在50 GHz处,损耗角正切约为0.09。进行了CV和IV测量,以确定低频和直流电介质特性。测量结果表明,ZrO 2 是一种有希望的材料,可用作射频(RF)微机电系统(MEMS)电容开关的介电层。

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