The zone plate focused soft X-rays of a scanning transmission X-ray microscope have been used to pattern poly(methyl methacrylate) and poly(dimethylglutarimide) films by a direct write method which is analogous to lithography with a focused electron beam. The lithographic characteristics of both polymers have been determined for 300 eV X-rays. With low doses (1 MGy), developed lines 40±5 nm wide were created in poly(methyl methacrylate). At higher doses an exposure spreading phenomenon substantially increases the lateral dimensions of the developed patterns. The spreading mechanism has been identified as the point-spread function of the zone plate lens. The performance of focused soft X-ray lithography is compared to other direct write methods. The practicality of a dedicated focused soft X-ray writer instrument is discussed.
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机译：已经使用扫描透射X射线显微镜的波带片聚焦软X射线通过类似于与聚焦电子束光刻的直接写入方法来图案化聚（甲基丙烯酸甲酯）和聚（二甲基戊二酰亚胺）膜。已针对300 eV X射线确定了两种聚合物的光刻特性。低剂量（1 MGy）时，在聚（甲基丙烯酸甲酯）中形成了40±5 nm宽的显影线。在较高剂量下，暴露扩散现象显着增加了显影图案的横向尺寸。散布机制已被确认为波带片透镜的点散布功能。将聚焦软X射线光刻的性能与其他直接写入方法进行了比较。讨论了专用聚焦软X射线记录仪的实用性。
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