Nanoimprint lithography with ≤60 nm overlay precision

摘要

Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm.