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Controllable growth of copper-phthalocyanine thin film on rough graphene substrate

机译:粗糙石墨烯基底上铜酞菁薄膜的可控生长

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摘要

Film growth behavior of copper-phthalocyanine (CuPc) on rough graphene (RG) and smooth graphene (SG) substrates was investigated experimentally. Both the RG and the SG are single layer graphene on metal substrates. The RG samples were prepared on copper foils and show rough surfaces; whereas, the SG samples prepared on Ni(111) substrates are characterized with much smoother surfaces. While CuPc molecules deposited on the two graphene substrates show similar molecular alignment, morphologies of the deposited films show considerable differences. On the SG substrate, CuPc molecules form two-dimensional islands with large size and sharp edges. While on the RG substrate, CuPc nucleates into particle-like grains without regular shapes. The high density of topographical defects on the RG substrate is believed to be a primary factor which leads to the formation of the smaller grains. The variation of thin film structures of CuPc with respect to the substrate temperature was also studied. Films with good crystallinity can still be obtained on the RG substrates when the substrate temperature is 80 °C or higher.
机译:实验研究了铜酞菁(CuPc)在粗糙石墨烯(RG)和光滑石墨烯(SG)衬底上的膜生长行为。 RG和SG都是金属基底上的单层石墨烯。 RG样品在铜箔上制备,并显示粗糙表面。而在Ni(111)衬底上制备的SG样品的特征是表面更加光滑。虽然沉积在两个石墨烯基板上的CuPc分子显示出相似的分子排列,但沉积膜的形貌显示出相当大的差异。在SG基板上,CuPc分子形成具有大尺寸和锋利边缘的二维岛。当在RG衬底上时,CuPc会成核成规则形状的颗粒状晶粒。认为RG衬底上的高形貌缺陷密度是导致较小晶粒形成的主要因素。还研究了CuPc薄膜结构相对于衬底温度的变化。当基底温度为80 C或更高时,仍可在RG基底上获得具有良好结晶度的薄膜。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第22期|1-5|共5页
  • 作者

    Dou Wei-Dong; Lee Chun-Sing;

  • 作者单位

    Physics Department, Shaoxing University, Shaoxing 312000, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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