Near-field-enhanced, mold-assisted, parallel direct nanostructuring of a gold thin film on glass

摘要

In this report, near-field enhancement around nanoridges and nanotips upon 532 nm pulsed laser irradiation is utilized to produce line or dot pattern on gold thin films deposited on glass substrates. The ridges and tips, which have end radii on the order of 50 nm, were fabricated out of silicon dioxide thin film on silicon by microfabrication techniques. A 30 nm chromium thin film was evaporated onto the ridges or tips by e-beam evaporation to enhance the near-field effect. Line and dot array were successfully patterned on the Au film with feature size ranging from 100 to 200 nm. Results from numerical simulation using finite difference time domain method agree with experimental results. (C) 2004 American Institute of Physics.