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Investigations on electroresistance effect in epitaxial manganite films using field effect configurations

机译:利用场效应结构研究外延锰矿薄膜的电阻效应

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摘要

The influence of static electric field on the transport properties in La_(0.7)A_(0.3)MnO_3 (A=Ca,Ba) epitaxial thin films was investigated by using field effect configurations (FEC). A single layer manganite film was deposited on LaAlO_3 (LAO) substrate by pulsed laser deposition technique, and then a simple FEC was formed on it using the lithography technique, in which the manganite film was used as a channel, and the LAO substrate as a gate. Surprising results were achieved by employing such a FEC. The transport resistance increases with a positive gate voltage but decreases with a negative bias, which means the electroresistance (ER) effect changes sign with the field direction. The observed reduction of resistivity for the La_(0.7)Ca_(0.3)MnO_3 and La_(0.7)Ba_(0.3)MnO_3 channels reaches ~32% and ~34% upon a bias of -80 and -300 V, respectively. The films could completely return to their pristine state after the bias was removed and the ER effect could be fully reproduced.
机译:利用场效应结构(FEC)研究了静电场对La_(0.7)A_(0.3)MnO_3(A = Ca,Ba)外延薄膜中输运性能的影响。通过脉冲激光沉积技术在LaAlO_3(LAO)衬底上沉积单层锰矿膜,然后使用光刻技术在其上形成简单的FEC,其中以锰矿膜为沟道,并以LAO衬底为衬底。门。通过使用这种FEC取得了令人惊讶的结果。传输电阻随着正栅极电压的增加而增加,而随着负偏置电压的降低而下降,这意味着电阻(ER)效应随电场方向改变符号。观察到的La_(0.7)Ca_(0.3)MnO_3和La_(0.7)Ba_(0.3)MnO_3通道的电阻率降低在-80和-300 V的偏压下分别达到〜32%和〜34%。消除偏压后,薄膜可以完全恢复到原始状态,并且可以完全再现ER效应。

著录项

  • 来源
    《Applied Physics Letters》 |2006年第13期|p.132502.1-132502.3|共3页
  • 作者

    F. X. Hu; J. Gao;

  • 作者单位

    Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;计量学;
  • 关键词

  • 入库时间 2022-08-18 03:21:54

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