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Ferromagnetic Cr_xTi_(1-x)N solid solution nitride thin films grown by pulsed laser deposition and their magnetoresistance

机译:脉冲激光沉积生长的铁磁Cr_xTi_(1-x)N固溶氮化物薄膜及其磁阻

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摘要

Epitaxial nitride films of Cr_xTi_(1-x)N were grown on MgO (001) by pulsed laser deposition under nitrogen radical irradiation, and their magnetic and transport properties were investigated, which was motivated by calculations on magnetism pointing out similarities of CrN to LaMnO_3, the parent compound of colossal magnetoresistance oxides. The films showed ferromagnetism for 0.28 ≤ x ≤ 0.5 and the T_c showed a maximum (140 K) at x =0.5. When x exceeded 0.5(x=0.58) ferromagnetism disappeared completely. At x=0.5, the nitride film showed a large magnetoresistance (6%-7% at 5 T), which had a maximum at 130 K.
机译:Cr_xTi_(1-x)N的外延氮化物膜在氮自由基辐照下通过脉冲激光沉积在MgO(001)上生长,并研究了其磁学和输运性质,这是通过磁学计算得出的,指出了CrN与LaMnO_3的相似性。 ,是巨大的磁阻氧化物的母体化合物。薄膜的铁磁性为0.28≤x≤0.5,T_c在x = 0.5时显示最大值(140 K)。当x超过0.5(x = 0.58)时,铁磁性完全消失。在x = 0.5时,氮化物膜显示出较大的磁阻(在5 T时为6%-7%),在130 K时具有最大值。

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