Nanochannels fabricated by high-intensity femtosecond laser pulses on dielectric surfaces

摘要

Direct scanning electron microscopy examination reveals a complex structure of narrow, micron-deep, internal nanochannels within shallow, nanoscale, external craters fabricated on glass and sapphire surfaces by single high-intensity femtosecond laser pulses, with nearly the same intensity thresholds for both features. Formation of the channels is accompanied by extensive expulsion of molten material produced via surface spallation and phase explosion mechanisms, and redeposited around the corresponding external craters. Potential mechanisms underlying fabrication of the unexpectedly deep channels in dielectrics are considered.