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首页> 外文期刊>Applied Physics Letters >In situ x-ray scattering study of self-organized nanodot pattern formation on GaSb(001) by ion beam sputtering
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In situ x-ray scattering study of self-organized nanodot pattern formation on GaSb(001) by ion beam sputtering

机译:离子束溅射在GaSb(001)上自组织纳米点图案形成的原位X射线散射研究

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摘要

The formation of self-organized nanodot patterns on GaSb(001) targets by ion beam sputtering has been studied in situ with grazing incidence small angle x-ray scattering. The temporal evolution of the patterns at different ion energies (300-1200 eV) has been monitored. The authors evidence a rapid coarsening in the characteristic wavelength until reaching a saturation value that scales with ion energy. The pattern evolves slower toward saturation for the lower ion energy while attaining a higher correlation length (normalized to the wavelength). The pattern time dependence is correlated with the influence of the sputtering rate on the pattern formation.
机译:利用掠入射小角度X射线散射原位研究了离子束溅射在GaSb(001)靶上形成自组织纳米点图案。监测了在不同离子能量(300-1200 eV)下图形的时间演变。作者证明,特征波长会迅速变粗,直到达到与离子能量成比例的饱和值。对于较低的离子能量,图形会朝饱和方向缓慢发展,同时获得较高的相关长度(标准化为波长)。图案时间依赖性与溅射速率对图案形成的影响相关。

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