Intrinsic stress evolution in nanocrystalline diamond thin films with deposition temperature

X. Xiao; B. W. Sheldon; Y. Qi; A. K. Kothari

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Intrinsic stress evolution in nanocrystalline diamond thin films with deposition temperature

机译：沉积温度下纳米晶金刚石薄膜的内在应力演化

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The stress evolution in nanocrystalline diamond (NCD) films deposited at different temperatures (from 800 to 400 ℃) was investigated. Results showed that the intrinsic stress gradually changed from tensile to compressive with decreasing deposition tempera

机译：研究了在不同温度（800至400℃）下沉积的纳米晶金刚石（NCD）膜中的应力演化。结果表明，随着沉积温度的降低，固有应力逐渐从拉伸变为压缩。

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《Applied Physicsletters》 |2008年第13期|82-84|共3页
作者
X. Xiao; B. W. Sheldon; Y. Qi; A. K. Kothari;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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Intrinsic stress evolution in nanocrystalline diamond thin films with deposition temperature

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