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Fine tuning epitaxial strain in ferroelectrics: Pb_xSr_(1-x)TiO_3 on DyScO_3

机译:铁电体中的微调外延应变:DyScO_3上的Pb_xSr_(1-x)TiO_3

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摘要

Epitaxial strain can be efficiently used to modify the properties of ferroelectric thin films. From the experimental viewpoint, the challenge is to fine-tune the magnitude of the strain. We illustrate here how, by using a suitable combination of composition and substrate, the magnitude of the epitaxial strain can be controlled in a continuous manner. The phase diagram of Pb_xSr_(1-x)TiO_3 films grown epitaxially on (110)-DyScO_3 is calculated using a Devonshire-Landau approach. A boundary between in-plane and out-of-plane oriented ferroelectric phases is predicted to take place at x ≈ 0.8. A series of Pb_xSr_(1-x)TiO_3 epitaxial films grown by molecular beam epitaxy shows good agreement with the proposed phase diagram.
机译:外延应变可以有效地用于改变铁电薄膜的性能。从实验的角度来看,挑战在于微调应变的大小。我们在这里说明如何通过使用适当的成分和衬底组合,以连续方式控制外延应变的大小。使用Devonshire-Landau方法计算在(110)-DyScO_3上外延生长的Pb_xSr_(1-x)TiO_3薄膜的相图。平面内和平面外的铁电相之间的边界预计在x≈0.8处发生。通过分子束外延生长的一系列Pb_xSr_(1-x)TiO_3外延膜与所提出的相图显示出良好的一致性。

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  • 来源
    《Applied Physics Letters》 |2010年第26期|p.262901.1-262901.3|共3页
  • 作者单位

    Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands DPMC, University of Geneva, Quai Ernest Ansermet 24, CH-1211 Geneve 4, Switzerland;

    rnZernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands;

    rnZernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:19:15

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