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Localized ultraviolet photoresponse in single bent ZnO microanowires

机译:单弯曲ZnO微纳米线中的局域紫外光响应

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摘要

The localized ultraviolet photoresponse in single bent ZnO microanowires bridging two Ohmic contacts has been investigated. The ZnO microanowire has a higher photoresponse sensitivity of about 190% at the bent region (bending strain: about 4%) than that at the straight region (about 50%). The rise and decay time constants are almost the same in the straight and bent regions of the ZnO microanowire. A possible mechanism has been proposed and discussed. The bent ZnO microanowires could be potentially useful for fabricating the coupled piezoelectric and optoelectronic nanodevices.
机译:研究了桥接两个欧姆接触的单弯曲ZnO微纳米线中的局部紫外光响应。 ZnO微/纳米线在弯曲区域(弯曲应变:约4%)比在直线区域(约50%)具有更高的光响应灵敏度,约为190%。在ZnO微米/纳米线的直线和弯曲区域中,上升和衰减时间常数几乎相同。已经提出并讨论了一种可能的机制。弯曲的ZnO微/纳米线可能潜在地用于制造耦合的压电和光电纳米器件。

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  • 来源
    《Applied Physics Letters》 |2010年第13期|p.133112.1-133112.3|共3页
  • 作者单位

    State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China;

    rnState Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China;

    rnState Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China;

    rnState Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China;

    rnState Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:19:05

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