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首页> 外文期刊>Applied Physics Letters >Phonon engineering in nanostructures: Controlling interfacial thermal resistance in multilayer-graphene/dielectric heterojunctions
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Phonon engineering in nanostructures: Controlling interfacial thermal resistance in multilayer-graphene/dielectric heterojunctions

机译:纳米结构中的声子工程:控制多层石墨烯/介电异质结中的界面热阻

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摘要

Using calculations from first principles and the Landauer approach for phonon transport, we study the Kapitza resistance in selected multilayer graphene/dielectric heterojunctions (hexagonal BN and wurtzite SiC) and demonstrate (i) the resistance variability (~50 - 700 × 10~(-10) m~2K/W) induced by vertical coupling, dimensionality, and atomistic structure of the system and (ii) the ability of understanding the intensity of the thermal transmittance in terms of the phonon distribution at the interface. Our results pave the way to the fundamental understanding of active phonon engineering by microscopic geometry design.
机译:利用第一性原理和Landauer声子传输方法的计算结果,我们研究了所选多层石墨烯/介电异质结(六方BN和纤锌矿SiC)中的Kapitza电阻,并证明了(i)电阻变化(〜50-700×10〜(- 10)由系统的垂直耦合,尺寸和原子结构引起的m〜2K / W,以及(ii)根据界面处的声子分布了解热透射强度的能力。我们的研究结果为通过微观几何设计对有源声子工程学的基本理解铺平了道路。

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  • 来源
    《Applied Physics Letters》 |2012年第11期|p.113111.1-113111.4|共4页
  • 作者单位

    Department of Electrical and Computer Engineering, North Carolina State University,Raleigh, North Carolina 27695-7911, USA;

    Department of Electrical and Computer Engineering, North Carolina State University,Raleigh, North Carolina 27695-7911, USA;

    Department of Electrical and Computer Engineering, North Carolina State University,Raleigh, North Carolina 27695-7911, USA;

    Department of Physics, Southern Illinois University, Carbondale, Illinois 62901, USA;

    lstituto Nanoscienze CNR-NAN0-S3,1-41100 Modena, Italy;

    Department of Physics and Department of Chemistry, University of North Texas, Denton, Texas 76203,USA and CSMD, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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