首页> 外文期刊>Applied Physics Letters >Electrical stabilities and memory mechanisms of organic bistable devices fabricated utilizing a poly(3,4-ethylene-dioxythiophene): Poly(styrenesulfonate) layer with a poly(methyl methacrylate) buffer layer
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Electrical stabilities and memory mechanisms of organic bistable devices fabricated utilizing a poly(3,4-ethylene-dioxythiophene): Poly(styrenesulfonate) layer with a poly(methyl methacrylate) buffer layer

机译:使用聚(3,4-乙烯-二氧噻吩):聚(苯乙烯磺酸盐)层与聚(甲基丙烯酸甲酯)缓冲层制造的有机双稳态器件的电稳定性和存储机理

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摘要

Organic bistable devices (OBDs) based on a poly(3,4-ethylene-dioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) layer with a poly(methyl methacrylate) (PMMA) buffer layer were fabricated on indium-tin-oxide (ITO)-coated polyethylene terephthalate (PET) flexible substrates. Current-voltage curves for, the AI/PEDOT:PSS/PMMA/ITO/PET device showed current bistabilities with an ON/OFF current ratio of 1 × 10~3, indicative of a significant enhancement of memory storage. The endurance number of the ON/OFF switchings for the OBDs was above 1 × 10~5 cycles showing high potential applications in read only memory devices. The memory mechanisms for the OBDs on the basis of oxidation and reduction operations were attributed to the filament processes.
机译:在氧化铟锡上制造了基于聚(3,4-乙烯-二氧噻吩):聚(苯乙烯磺酸盐)(PEDOT:PSS)层和聚(甲基丙烯酸甲酯)(PMMA)缓冲层的有机双稳态器件(OBD) (ITO)涂层的聚对苯二甲酸乙二醇酯(PET)柔性基板。 AI / PEDOT:PSS / PMMA / ITO / PET器件的电流-电压曲线显示了电流双稳态,其开/关电流比为1×10〜3,表明显着增强了内存存储。 OBD的ON / OFF开关的耐久数超过1×10〜5个周期,这表明在只读存储设备中有很高的应用潜力。基于氧化和还原操作的OBD的存储机制归因于细丝工艺。

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  • 来源
    《Applied Physics Letters》 |2012年第18期|p.183303.1-183303.3|共3页
  • 作者单位

    Department of Electronics and Computer Engineering, Hanyang University, Seoul 133-791, Korea;

    Department of Electronics and Computer Engineering, Hanyang University, Seoul 133-791, Korea;

    Department of Electronics and Computer Engineering, Hanyang University, Seoul 133-791, Korea;

    Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea;

    Department of Electronics and Computer Engineering, Hanyang University, Seoul 133-791, Korea,Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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