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A cell-based clustering model for the reset statistics in RRAM

机译:RRAM中用于重置统计信息的基于单元的集群模型

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摘要

In this letter, the experimental reset voltage and current statistics in a Cu/HfO_2/Pt RRAM device are found to deviate from the Weibull model in the high percentiles. A clustering model is developed for the reset statistics based on the cell-based model. The relationship between the parameters (Weibull slope, scale factor, and clustering factor) of the clustering model and on-state resistance is established. The modeling results are in good agreement with the experimental data of reset voltage and reset current statistics. Our model explains well why the tail bits of experimental data appear in the high percentiles. The implicit meaning of the scale factor of the clustering model is explored, which represents the threshold point that defects emerge to cluster.
机译:在这封信中,发现在高百分位数中,Cu / HfO_2 / Pt RRAM器件中的实验复位电压和电流统计数据偏离了Weibull模型。针对基于单元格模型的重置统计信息,开发了一个聚类模型。建立了聚类模型的参数(Weibull斜率,比例因子和聚类因子)与通态电阻之间的关系。建模结果与复位电压和复位电流统计数据的实验数据吻合良好。我们的模型很好地解释了为什么实验数据的尾部出现在高百分位数中。探索了聚类模型的比例因子的隐含含义,它代表缺陷出现聚类的阈值点。

著录项

  • 来源
    《Applied Physics Letters》 |2017年第12期|123503.1-123503.5|共5页
  • 作者单位

    Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China;

    Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China ,University of Chinese Academy of Sciences, Beijing 100049, China ,Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing 210023, China;

    Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China;

    Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China ,University of Chinese Academy of Sciences, Beijing 100049, China ,Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing 210023, China;

    Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China ,University of Chinese Academy of Sciences, Beijing 100049, China ,Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing 210023, China;

    Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China ,University of Chinese Academy of Sciences, Beijing 100049, China ,Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing 210023, China;

    Departament d'Enginyeria Electrònica, Universitat Autònoma de Barcelona, Bellaterra 08193, Spain;

    Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China ,University of Chinese Academy of Sciences, Beijing 100049, China ,Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing 210023, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:14:00

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