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Fabrication and efficiency measurement of a Mo/C/Si/C three material system multilayer Laue lens

机译:Mo / C / Si / C三材料系统多层劳厄透镜的制备和效率测量

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摘要

In this letter, we report on the manufacturing of a multilayer Laue lens (MLL) consisting of a multilayer stack with three materials: molybdenum and silicon as the absorber and spacer layer, respectively, and carbon as transition layers. The design has four layers per period: Mo/C/Si/C. It yields 6000 zones and provides an aperture of 50 μm. This allows the MLL structure to accept a large portion of the coherent part of the beam and to achieve a small spot size. The MLL deposition was made by magnetron sputtering at the Fraunhofer IWS, and the sectioning was done by laser cutting and subsequent focused ion beam milling to a thickness that provides a good efficiency for a photon energy of 12keV. The diffraction efficiency as a function of the tilting angle has been measured at beamline 1-BM of the Advanced Photon Source. An efficiency of almost 40% has been achieved. This shows that the material system performs well compared to MLLs made of two-materials and that it is in excellent agreement with the numerically calculated efficiency for a comparable molybdenum/silicon bilayer system lens. We conclude that the three material system offers high efficiencies and is advantageous for stress reduction in MLLs.
机译:在这封信中,我们报告了多层Laue透镜(MLL)的制造过程,该多层透镜由多层堆叠组成,其中三种材料分别为:钼和硅分别作为吸收层和间隔层,碳为过渡层。该设计每个周期有四层:Mo / C / Si / C。它产生6000个区域,并提供50μm的孔径。这允许MLL结构接受光束的大部分相干部分并获得小的光斑尺寸。 MLL沉积是通过Fraunhofer IWS上的磁控溅射进行的,并且通过激光切割和随后的聚焦离子束铣削完成切片,使其厚度达到12keV的光子能提供良好的效率。已经在先进光子源的光束线1-BM处测量了作为倾斜角函数的衍射效率。效率几乎达到40%。这表明与由两种材料制成的MLL相比,该材料系统的性能良好,并且与可比较的钼/硅双层系统透镜的数值计算效率非常吻合。我们得出的结论是,这三种材料系统具有很高的效率,并且有利于降低MLL中的应力。

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  • 来源
    《Applied Physics Letters》 |2017年第11期|111905.1-111905.5|共5页
  • 作者单位

    Fraunhofer IWS Dresden, Winterbergstr. 28, 01277 Dresden, Germany;

    Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA;

    Leibniz-Institut fur Polymerforschung Dresden e.V., Hohe Str. 6, 01069 Dresden, Germany;

    Fraunhofer IWS Dresden, Winterbergstr. 28, 01277 Dresden, Germany;

    Fraunhofer IWS Dresden, Winterbergstr. 28, 01277 Dresden, Germany;

    Fraunhofer IWS Dresden, Winterbergstr. 28, 01277 Dresden, Germany;

    Fraunhofer IWS Dresden, Winterbergstr. 28, 01277 Dresden, Germany;

    Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:00

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