Single-shot X-ray dark-field imaging with omnidirectional sensitivity using random-pattern wavefront modulator

摘要

With the development of multi-modal x-ray imaging techniques, dark-field signals have drawn increasing interest due to the complementary information to the conventional attenuation-contrast signal. The directional sensitivity of the dark-field signal can reveal the orientation of the microstructure of the imaged object. We propose to use single-shot dark-field imaging with a random-pattern wavefront modulator to achieve omni-directional sensitivity, which will be valuable for the study of strongly ordered systems. Compared to previous studies, the proposed method shows significant advance by requiring neither dedicated fabrication of x-ray optics nor prolonged scanning. The treatment has been demonstrated on images acquired both at synchrotron facilities and with a laboratory source. The flexibility and the accessibility ensure the potential for easy implementation of the method to benefit a wide range of fields. (C) 2018 Author(s).