机译:Ge(111)和Ge-on-Si(111)上的应变Si_(1-x)Ge_x的临界厚度
Tokyo City Univ, Adv Res Labs, Setagaya Ku, 8-15-1 Todoroki, Tokyo 1580082, Japan;
Tokyo City Univ, Adv Res Labs, Setagaya Ku, 8-15-1 Todoroki, Tokyo 1580082, Japan;
Tokyo City Univ, Adv Res Labs, Setagaya Ku, 8-15-1 Todoroki, Tokyo 1580082, Japan;
Tokyo City Univ, Adv Res Labs, Setagaya Ku, 8-15-1 Todoroki, Tokyo 1580082, Japan;
Osaka Univ, Grad Sch Engn Sci, Dept Syst Innovat, Toyonaka, Osaka 5608531, Japan;
Osaka Univ, Grad Sch Engn Sci, Dept Syst Innovat, Toyonaka, Osaka 5608531, Japan|Osaka Univ, Grad Sch Engn Sci, Ctr Spintron Res Network, Toyonaka, Osaka 5608531, Japan;
Tokyo City Univ, Adv Res Labs, Setagaya Ku, 8-15-1 Todoroki, Tokyo 1580082, Japan;
机译:GE(111)和Ge-On-Si(111)上的应变Si_(1-x)Ge_x的临界厚度
机译:应变GE /(111)Si_(1-x)Ge_x的价带结构和空穴迁移率
机译:应变Si /(111)Si_(1-x)Ge_x的带边缘水平的计算
机译:Ge-on-Si(111)和Ge(111)衬底上的应变Si_(1-x)Ge_x的临界膜厚度
机译:锗(111)相变上的铅和铜(111)磁性表面合金上的铁(x)/镍(1-x)的薄膜显微镜观察。
机译:跨过应变的氧化和羟基化的Pt(111)的结合位点转变
机译:加压$ CeCu_2(si_ {1-x} Ge_x)_2 $中的非费米液态 系统:两个关键点
机译:si_(1-x)Ge_x / si异质结内部光电发射红外探测器的光响应模型