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机译:简单光耦合掩模光刻技术增强纳米图案化p-GaN的GaN基发光二极管的光功率
Corporate R&D, LG Chem Research Park, Daejon 305-380, Korea;
Heeger Center for Advanced Materials (HCAM), School of Materials Science and Engineering, Department of Nanobio Materials and Electronics,Gwangju Institute of Science and Technology (GIST), Gwangju 500-712, Korea;
Department of Electronic Engineering, Yeungnam University, Gyeongsan, Gyeongbuk 712-749, Korea;
Heeger Center for Advanced Materials (HCAM), School of Materials Science and Engineering, Department of Nanobio Materials and Electronics,Gwangju Institute of Science and Technology (GIST), Gwangju 500-712, Korea;
机译:通过使用多次曝光纳米球透镜光刻技术在具有可调填充因子的铟锡氧化物上进行纳米构图来增强GaN基发光二极管的光功率
机译:多重曝光纳米球透镜光刻技术提高复合光子晶体GaN基发光二极管的光功率
机译:通过使用多次曝光纳米球透镜光刻技术在具有可调填充因子的铟锡氧化物上进行纳米构图来增强GaN基发光二极管的光功率
机译:H
机译:GaN基发光二极管上的光学功能结构,用于提高光提取效率和控制发射模式。
机译:通过在p-GaN表面图案化光子准晶体和n侧侧壁粗糙化来增强GaN基发光二极管的光输出功率
机译:通过在p-GaN表面图案化光子准晶体和n侧侧壁粗糙化来增强GaN基发光二极管的光输出功率