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首页> 外文期刊> >Enhanced Optical Power of GaN-Based Light-Emitting Diode with Nanopatterned p-GaN by Simple Light Coupling Mask Lithography
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Enhanced Optical Power of GaN-Based Light-Emitting Diode with Nanopatterned p-GaN by Simple Light Coupling Mask Lithography

机译:简单光耦合掩模光刻技术增强纳米图案化p-GaN的GaN基发光二极管的光功率

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摘要

We report the enhancement of the optical output power of GaN-based blue light-emitting diode (LED) with two-dimensionally nanopatterned p-GaN fabricated using a novel light coupling mask with soft-lithographically defined light aperture arrays. This light coupling mask provided a simple and reproducible process to generate patterns with a regular hole size of 550 nm on p-GaN. The LED with nanopatterned p-GaN showed light output power improved by 11.2% at an input current of 20 mA compared with the LED with flat p-GaN, even with slightly degraded electrical properties owing to the formation of etching-induced defects in the p-GaN.
机译:我们报告了使用新型的光耦合掩模和软光刻定义的光孔径阵列制造的二维纳米图案化p-GaN,增强了基于GaN的蓝色发光二极管(LED)的光输出功率。这种光耦合掩模提供了一种简单且可重复的过程,可以在p-GaN上生成具有550 nm规则孔径的图形。具有纳米图案p-GaN的LED与具有平坦p-GaN的LED相比,在输入电流为20 mA的情况下,其光输出功率提高了11.2%,尽管由于在p中形成了蚀刻引起的缺陷,电性能略有下降。 -氮化镓

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  • 来源
    《》 |2012年第2期|p.022101.1-022101.3|共3页
  • 作者单位

    Corporate R&D, LG Chem Research Park, Daejon 305-380, Korea;

    Heeger Center for Advanced Materials (HCAM), School of Materials Science and Engineering, Department of Nanobio Materials and Electronics,Gwangju Institute of Science and Technology (GIST), Gwangju 500-712, Korea;

    Department of Electronic Engineering, Yeungnam University, Gyeongsan, Gyeongbuk 712-749, Korea;

    Heeger Center for Advanced Materials (HCAM), School of Materials Science and Engineering, Department of Nanobio Materials and Electronics,Gwangju Institute of Science and Technology (GIST), Gwangju 500-712, Korea;

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