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Voscous slip along grain boundaries in chlorine-Doped silicon Nitride

机译:掺氯氮化硅中的粘性滑移沿晶界移动

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摘要

The effect of chlorine doping on the anelastic-relaxation and torsional-creep behavior of a silicon nitride (Si_3N_4) polycrystalline body was studied. Two model polycrys- tals-one undoped and the other doped with a small frac- tion of chlorine-were investigated. Their microstructures consisted of equiaxed and well-faceted Si_3N_4 grains whose boundaries were separated by a continuous, nanometer- sized film of silica (SiO_2) glass.
机译:研究了氯掺杂对氮化硅(Si_3N_4)多晶体的无弹性弛豫和扭转蠕变行为的影响。研究了两种模型多晶体,一种是未掺杂的,另一种是掺有少量氯的。它们的微结构由等轴和面晶良好的Si_3N_4晶粒组成,它们的边界被连续的纳米级二氧化硅(SiO_2)玻璃膜隔开。

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