Microhardess of sputter-deposited zirconia films on silicon wafers

摘要

Calcia-stabilized zirconia films were deposited on the sur- face of silicon <111> wafers using radio frequency (rf) mag- netron sputter deposition. Deposition was conducted at substrate temperatures that varied in the range of 80°- 900 deg C. X-ray diffractometry results showed that all the films consisted of cubic zirconia.