Direct Nanopatterning of Metal Surfaces Using Self-Assembled Molecular Films

摘要

The development of new methods for patterning in the sub-100 nra range has been a primary motivation for research at the nanometer frontier. Nanopatterned materials are required for the development of new technologies such as those required for next-generation data storage devices, fabrication of more efficient low-cost catalytic surfaces, production of optical devices with new properties building smaller and more selective sensors and biosensors, and designing new biomaterials with enhanced biocompatible properties. New methods for serial fabrication of nanopatterned materials should be non-destructive and allow large-scale patterning and easy and low-cost implementation. Self-assembled monolayers (SAMs) have been widely studied for nano-/mi-crofabrication purposes.