Wafer-Scale Precise Patterning of Organic Single-Crystal Nanowire Arrays via a Photolithography-Assisted Spin-Coating Method

摘要

A photolithography-assisted spin-coating approach is developed to produce single-crystal organic nanowire (NW) arrays at designated locations with high precision and high efficiency. This strategy enables the large-scale fabrication of organic NW arrays with nearly the same accuracy, reliability, and flexibility as photolithography. The high mobilities of the organic NWs enable the control of the switch of multi-colored light-emitting devices with good stability.