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首页> 外文期刊>Advanced Materials >Controlling Defects in Continuous 2D GaS Films for High-Performance Wavelength-Tunable UV-Discriminating Photodetectors
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Controlling Defects in Continuous 2D GaS Films for High-Performance Wavelength-Tunable UV-Discriminating Photodetectors

机译:控制连续2D GaS膜中用于高性能波长可调紫外线分光光探测器的缺陷

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摘要

A chemical vapor deposition method is developed for thickness-controlled (one to four layers), uniform, and continuous films of both defective gallium(II) sulfide (GaS): GaS0.87 and stoichiometric GaS. The unique degradation mechanism of GaS0.87 with X-ray photoelectron spectroscopy and annular dark-field scanning transmission electron microscopy is studied, and it is found that the poor stability and weak optical signal from GaS are strongly related to photo-induced oxidation at defects. An enhanced stability of the stoichiometric GaS is demonstrated under laser and strong UV light, and by controlling defects in GaS, the photoresponse range can be changed from vis-to-UV to UV-discriminating. The stoichiometric GaS is suitable for large-scale, UV-sensitive, high-performance photodetector arrays for information encoding under large vis-light noise, with short response time (<66 ms), excellent UV photoresponsivity (4.7 A W-1 for trilayer GaS), and 26-times increase of signal-to-noise ratio compared with small-bandgap 2D semiconductors. By comprehensive characterizations from atomic-scale structures to large-scale device performances in 2D semiconductors, the study provides insights into the role of defects, the importance of neglected material-quality control, and how to enhance device performance, and both layer-controlled defective GaS0.87 and stoichiometric GaS prove to be promising platforms for study of novel phenomena and new applications.
机译:已开发出一种化学气相沉积方法,用于厚度受控(一层至四层),均匀且连续的有缺陷的硫化镓(IIS):GaS0.87和化学计量GaS的薄膜。用X射线光电子能谱和环形暗场扫描透射电子显微镜研究了GaS0.87的独特降解机理,发现GaS的不良稳定性和弱的光信号与缺陷处的光致氧化强烈相关。 。在激光和强紫外光下,化学计量GaS的稳定性得到了增强,并且通过控制GaS中的缺陷,可以将光响应范围从可见光变为UV到区分紫外线。化学计量的GaS适用于大规模,对紫外线敏感的高性能光电探测器阵列,用于在可见光噪声较大的情况下进行信息编码,响应时间短(<66 ms),出色的紫外光响应性(三层膜为4.7 A W-1) (GaS),与小带隙2D半导体相比,信噪比提高了26倍。通过从2D半导体中的原子级结构到大规模器件性能的全面表征,该研究可以洞悉缺陷的作用,被忽略的材料质量控制的重要性以及如何增强器件性能,以及层控制缺陷GaS0.87和化学计量GaS被证明是研究新现象和新应用的有前途的平台。

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