Patterning of Oriented Photofunctional Polymer Systems Through Selective Photobleaching

摘要

Many applications of semiconducting conjugated polymers in (opto) electronic devices require the patterning of these func- tional materials into structures with feature sizes of typically between 1 and 100 μm, ideally by simple and reliable methods. We demonstrate that selective photobleaching, i.e., a spatially resolved change of the chemical structure of the active species by ir- radiation through an appropriate mask, is an extremely simple and versatile technique that satisfies this need. The process is particularly attractive for structuring oriented materials that exhibit anisotropic properties and is of potential interest for a broad range of applications.