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首页> 外文期刊>Advanced Functional Materials >Sharp infrared emission from single-crystalline indium nitride nanobelts prepared using guided-stream thermal chemical vapor deposition
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Sharp infrared emission from single-crystalline indium nitride nanobelts prepared using guided-stream thermal chemical vapor deposition

机译:使用导流热化学气相沉积法制备的单晶氮化铟纳米带发出的尖锐红外光

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摘要

Single-crystalline InN nanobelts have been synthesized using An as the catalyst by a guided-stream thermal chemical vapor deposition technique. The resultant InN nanobelts typically have widths ranging from 20 to 200 nm, a width to thickness ratio of 2-10, and lengths of up to several tens of micrometers. Structural analysis shows that these InN nanobelts have a wurtzite structure and exhibit a rectangular cross section with self-selective facets, i.e., the nanobelts are enclosed only by +/-(001) and +/-(1 (1) over bar0) planes with [110] being the exclusive growth direction along their long axis. This facet selectivity can be understood by the differences in the surface energies of the different facets. Photoluminescence (PL) spectra of InN nanobelts show a sharp infrared emission peak at 0.76 eV with a full width at half maximum of 14 meV, narrower than the values reported for InN epilayers. The integrated PL intensity is found to increase linearly with the excitation power, which suggests that the observed PL can be attributed to direct band-to-band emission.
机译:已经通过引导流热化学气相沉积技术使用An作为催化剂合成了单晶InN纳米带。所得的InN纳米带通常具有20到200 nm的宽度,2到10的宽厚比以及长达数十微米的长度。结构分析表明,这些InN纳米带具有纤锌矿结构,并具有带有自选小平面的矩形横截面,即纳米带仅被bar0平面上的+/-(001)和+/-(1(1))包围其中[110]是沿其长轴的专有增长方向。可以通过不同方面的表面能的差异来理解此方面的选择性。 InN纳米带的光致发光(PL)光谱在0.76 eV处显示了一个尖锐的红外发射峰,其半峰全宽为14 meV,比InN外延层的值要窄。发现积分的PL强度随激发功率线性增加,这表明观察到的PL可归因于直接的带间发射。

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