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首页> 外文期刊>Advanced Functional Materials >Hierarchical Superhydrophobic Surfaces Fabricated by Dual-Scale Electron-Beam-Lithography with Well-Ordered Secondary Nanostructures
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Hierarchical Superhydrophobic Surfaces Fabricated by Dual-Scale Electron-Beam-Lithography with Well-Ordered Secondary Nanostructures

机译:具有良好的次级纳米结构的双尺度电子束平版印刷术制造的分层超疏水表面

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摘要

Recent studies on superhydrophobic surfaces have revealed the important roles of structural hierarchy in the overall properties of these surfaces. Here, a novel, versatile, and efficient technique is introduced for fabricating macroscopic hierarchical superhydrophobic surfaces with both well-defined primary microstructures and well-ordered secondary nanostructures using electron-beam lithography. With this technique, the engineering capability of controlling the size, shape, and distribution of the secondary-features is demonstrated, which allows a systematic and quantitative study of the individual effects of these parameters. Superhydrophobic surfaces produced by this new technique exhibit two distinctive wetting behaviors, high and low adhesion. The structural characteristics and structure-property relations of each of those two regimes are discussed.
机译:最近对超疏水表面的研究表明,结构层次在这些表面的整体性能中具有重要作用。在这里,介绍了一种新颖,通用和有效的技术,用于使用电子束光刻技术来制造具有清晰定义的初级微观结构和有序的次级纳米结构的宏观分层超疏水表面。通过这种技术,展示了控制次要特征的大小,形状和分布的工程能力,从而可以对这些参数的各个影响进行系统和定量的研究。用这种新技术生产的超疏水表面表现出两种独特的润湿行为,即高粘附力和低粘附力。讨论了这两种制度的结构特征和结构性质关系。

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  • 来源
    《Advanced Functional Materials 》 |2011年第19期| p.3715-3722| 共8页
  • 作者单位

    Physics Department University of Massachusetts Amherst, United States;

    rnPhysics Department University of Massachusetts Amherst, United States;

    rnDepartment of Mechanical and Industrial Engineering University of Massachusetts Amherst, United States;

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  • 正文语种 eng
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