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Thickness-Dependent Structure-Property Relationships in Strained (110) SrRuO_3 Thin Films

机译:(110)SrRuO_3薄膜的厚度依赖性结构-性能关系

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摘要

Thickness-dependent structure-property relationships in strained SrRuO_3 thin films on CdScO_3 (CSO) substrates are reported. The film is found to have epitaxially stabilized crystal structures that vary with the film thickness. Below 16 nm, the √2a_(pc) ×√2a_(pc) × 2a_(pc) monoclinic structure is stabilized while above 16 nm the film has the a_(pc) ×2a_(pc)×a_(pc) tetragonal structure. The thickness-dependent structural changes are ascribed to the substrate-induced modification in the RuO_6 octahedral rotation pattern, which highlights the significance of the octahedral rotations for the epitaxial strain accommodation in the coherently-grown films. Close relationships between the structural and physical properties of the films are also found. The monoclinic film has the uniaxial magnetic easy axis 45° away from the [110]_(GSO) direction while the tetragonal film has the one that lies along the in-plane [1-10]_(GSO) direction. The results demonstrate that the octahedral rotations in the strained per-ovskite oxide thin films are a key factor for determining their structure phases and physical properties.
机译:报道了在CdScO_3(CSO)衬底上的应变SrRuO_3薄膜中厚度依赖的结构-性质关系。发现该膜具有随膜厚度变化的外延稳定的晶体结构。在16 nm以下,√2a_(pc)×√2a_(pc)×2a_(pc)单斜晶结构稳定,而在16 nm以上,膜具有a_(pc)×2a_(pc)×a_(pc)四方结构。厚度相关的结构变化归因于RuO_6八面体旋转模式中的基体诱导修饰,这突出了八面体旋转对于相干生长的薄膜中外延应变适应的重要性。还发现了膜的结构和物理性质之间的紧密关系。单斜膜具有与[110] _(GSO)方向相距45°的单轴磁易轴,而四方膜具有沿着面内[1-10] _(GSO)方向的轴。结果表明,应变过钙钛矿氧化物薄膜中的八面体旋转是确定其结构相和物理性质的关键因素。

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  • 来源
    《Advanced Functional Materials》 |2013年第9期|1129-1136|共8页
  • 作者单位

    Institute for Chemical Research Kyoto University and Japan Science and Technology Agency CREST, Uji, Kyoto 611-0011, Japan;

    Institute for Chemical Research Kyoto University and Japan Science and Technology Agency CREST, Uji, Kyoto 611-0011, Japan;

    Institute for Chemical Research Kyoto University and Japan Science and Technology Agency CREST, Uji, Kyoto 611-0011, Japan;

    Institute for Chemical Research Kyoto University and Japan Science and Technology Agency CREST, Uji, Kyoto 611-0011, Japan;

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