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Strain Control of Oxygen Vacancies in Epitaxial Strontium Cobaltite Films

机译:外延锶锶钴薄膜中氧空位的应变控制

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摘要

The ability to manipulate oxygen anion defects rather than metal cations in complex oxides can facilitate creating new functionalities critical for emerging energy and device technologies. However, the diffi culty in activating oxygen at reduced temperatures hinders the deliberate control of important defects, oxygen vacancies. Here, strontium cobaltite (SrCoOx) is used to demonstrate that epitaxial strain is a powerful tool for manipulating the oxygen vacancy concentration even under highly oxidizing environments and at annealing temperatures as low as 300 degrees C. By applying a small biaxial tensile strain (2%), the oxygen activation energy barrier decreases by approximate to 30%, resulting in a tunable oxygen defi cient steady-state under conditions that would normally fully oxidize unstrained cobaltite. These strain-induced changes in oxygen stoichiometry drive the cobaltite from a ferromagnetic metal towards an antiferromagnetic insulator. The ability to decouple the oxygen vacancy concentration from its typical dependence on the operational environment is useful for effectively designing oxides materials with a specifi c oxygen stoichiometry.
机译:处理复杂复合氧化物中的氧阴离子缺陷而不是金属阳离子的能力可以促进创建对于新兴能源和设备技术至关重要的新功能。然而,在降低的温度下活化氧气的困难阻碍了对重要缺陷,氧空位的有意控制。在这里,钴酸锶(SrCoOx)用于证明即使在高氧化环境和低至300摄氏度的退火温度下,外延应变也是控制氧空位浓度的有力工具。通过施加小的双轴拉伸应变(2% ),氧气活化能垒降低了约30%,从而在通常会完全氧化未应变钴矿的条件下,产生了可调节的缺氧稳态。这些由应变引起的氧气化学计量的变化将钴从铁磁性金属驱赶到反铁磁性绝缘体。将氧空位浓度从其对操作环境的典型依赖性中解耦的能力对于有效设计具有特定氧化学计量比的氧化物材料很有用。

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  • 来源
    《Advanced Functional Materials》 |2016年第10期|1564-1570|共7页
  • 作者单位

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

    Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA;

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

    Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA;

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