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首页> 外文期刊>Advanced Functional Materials >Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications
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Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications

机译:杂化分子层沉积法在电化学应用中生长的结构稳定的烷氧基锰薄膜

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Hybrid molecular layer deposition (MLD) has significant potential for the creation of ultrathin electrochemically active materials, due to its ability to combine organic and inorganic species to modulate film properties. However, only a limited number of hybrid MLD processes are demonstrated with electrochemically relevant elements, such as manganese. Here, a "manganicone" manganese hybrid MLD chemistry is developed using the precursors bis(ethylcyclopentadienyl)manganese and ethylene glycol. The resulting manganese alkoxide coordination networks are shown to have many interesting properties, including the ability to seamlessly fill high aspect ratio vias and the chemical conversion into manganese carboxylate in air over several hours at room temperature. Linear, self-saturating growth is reported. Importantly, hybrid manganicone films annealed to 480 degrees C in air demonstrate a greater stability to restructuring during electrochemical testing than their inorganic counterparts grown by atomic layer deposition, without reducing the activity of the reactive sites on the manganese surface. Thus, hybrid manganese films grown by MLD have significant promise for use as catalysts for the oxygen evolution reaction and as electrodes in thin film batteries.
机译:杂化分子层沉积(MLD)具有产生超薄电化学活性材料的巨大潜力,这是因为它具有结合有机和无机物质来调节薄膜性能的能力。但是,只有有限数量的混合MLD工艺与电化学相关元素(如锰)一起被证明。在此,使用前体双(乙基环戊二烯基)锰和乙二醇开发了“锰酮”锰杂化MLD化学。所得的烷氧基锰配位网络显示出许多有趣的特性,包括无缝填充高深宽比通孔的能力以及在室温下数小时内在空气中化学转化为羧酸锰的能力。据报道线性,自饱和增长。重要的是,在空气中退火至480摄氏度的混合锰有机硅膜在电化学测试过程中显示出比通过原子层沉积法生长的无机对应物更大的重组稳定性,同时又不降低锰表面活性部位的活性。因此,通过MLD生长的混合锰膜具有很大的前景,可以用作氧释放反应的催化剂和薄膜电池中的电极。

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