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首页> 外文期刊>Acta Materialia >COMPUTER SIMULATION OF TOPOLOGICAL EVOLUTION IN 2-D GRAIN GROWTH USING A CONTINUUM DIFFUSE-INTERFACE FIELD MODEL
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COMPUTER SIMULATION OF TOPOLOGICAL EVOLUTION IN 2-D GRAIN GROWTH USING A CONTINUUM DIFFUSE-INTERFACE FIELD MODEL

机译:基于连续扩散界面模型的二维晶粒生长拓扑演化的计算机模拟

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摘要

The local kinetics and topological phenomena during normal grain growth were studied in two dimensions by computer simulations employing a continuum diffuse-interface field model. The reationships between topological class and individual grain growth kinetics were exsamined, and compared with results obtained previously from analytical theories, experimental results and Monte Carlo simulations. It was shown that both the grain-size and grain-shape (side) distributions and time-invariant and the linear relationship between the mean radii of individual grains and topological class n was reproduced.
机译:通过使用连续扩散界面场模型的计算机模拟,从二维角度研究了正常晶粒生长过程中的局部动力学和拓扑现象。考察了拓扑类别与单个晶粒生长动力学之间的关系,并将其与先前从分析理论,实验结果和蒙特卡洛模拟获得的结果进行了比较。结果表明,晶粒尺寸和晶粒形状(侧面)分布以及时不变性以及单个晶粒的平均半径与拓扑n类之间的线性关系均得到了再现。

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