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Study of InN epitaxial films and nanorods grown on GaN template by RF-MOMBE

机译:用RF-MOMBE研究GaN模板上生长的InN外延膜和纳米棒

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摘要

This paper reports on high-quality InN materials prepared on a GaN template using radio-frequency metalorganic molecular beam epitaxy. We also discuss the structural and electro-optical properties of InN nanorods/films. The X-ray diffraction peaks of InN(0002) and InN(0004) were identified from their spectra, indicating that the (0001)-oriented hexagonal InN was epitaxially grown on the GaN template. Scanning electron microscopic images of the surface morphology revealed a two-dimensional growth at a rate of approximately 0.85 μm/h. Cross-sectional transmission electron microscopy images identified a sharp InN/GaN interface and a clear epitaxial orientation relationship of [0001]InN // [0001]GaN and ( 2¯110)InN // ( 2¯110)GaN. The optical properties of wurtzite InN nanorods were determined according to the photoluminescence, revealing a band gap of 0.77 eV.
机译:本文报道了使用射频金属有机分子束外延在GaN模板上制备的高质量InN材料。我们还将讨论InN纳米棒/薄膜的结构和光电特性。从它们的光谱中鉴定出InN(0002)和InN(0004)的X射线衍射峰,表明在GaN模板上外延生长了(0001)取向的六方InN。表面形态的扫描电子显微镜图像显示二维生长速度约为0.85μm/ h。截面透射电子显微镜图像确定了清晰的InN / GaN界面和清晰的[0001] InN // [0001] GaN和( 2 < mo Stretchy =“ true”>¯ 110 )InN //( 2 < / mn> ¯ 110 )GaN。根据光致发光确定纤锌矿InN纳米棒的光学性能,发现带隙为0.77 eV。

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