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Ultraviolet exposure of Gafchromic XR‐RV3 and XR‐SP2 films

机译:Gafchromic XR-RV3和XR-SP2胶片的紫外线曝光

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摘要

Gafchromic film has been used for X‐ray dose measurement in diagnostic examinations. Their use has been initiated for three‐dimensional X‐ray dose measurement by using the high‐resolution characteristics of Gafchromic films in computed tomography. However, it is necessary to solve the problem of nonuniform thickness in the active layers of Gafchromic films. A double exposure technique using X‐rays is performed in therapeutic radiology; it is difficult to use in a diagnostic examination because of the heel effect. Therefore, it is suggested that ultraviolet (UV) rays be substituted for X‐rays. However, the appropriate UV wavelength is unknown. In this study, we aimed to determine which UV wavelengths are effective to expose Gafchromic XR‐RV3 and XR‐SP2. UV lamps with peak wavelengths of 245 nm, 310 nm, and 365 nm were used. The three UV wavelengths were used to irradiate Gafchromic XR‐RV3 and XR‐SP2 films for 60 min, and irradiation was repeated every 60 min for 600 min thereafter. Films were scanned after each irradiation period on a flatbed scanner. The images were split into their red‐green‐blue components, and red images were stored using ImageJ version 1.44o image analysis software. Regions of interest (ROI), 0.5 inches in diameter, were placed at the centers of the subtracted Gafchromic film images, and graphs of UV irradiation duration and mean pixel values were plotted. There were reactions to UV‐A on both Gafchromic XR‐RV3 and XR‐SP2; those to UV‐B were moderate. However, UV‐C demonstrated few reactions with Gafchromic XR‐RV3 and XR‐SP2. From these results, irradiation with UV‐A may be able to correct nonuniformity errors. Uniform UV‐A irradiation of Gafchromic films with large areas is possible, and UV rays can be used as a substitute for X‐rays in the double exposure technique.PACS number: 87.53 Bn
机译:全反射膜已用于诊断检查中的X射线剂量测量。通过在计算机断层扫描中使用加菲发性胶片的高分辨率特征,将其用于三维X射线剂量测量。然而,有必要解决在Gafchromic膜的有源层中厚度不均匀的问题。在放射治疗中采用了X射线的双曝光技术。由于脚跟效应,很难在诊断检查中使用。因此,建议用紫外线(X)代替。但是,合适的紫外线波长是未知的。在这项研究中,我们旨在确定哪些紫外线波长可有效暴露Gafchromic XR-RV3和XR-SP2。使用峰值波长为245 nm,310 nm和365 nm的UV灯。使用三个紫外线波长照射Gafchromic XR-RV3和XR-SP2膜60分钟,此后每60分钟重复照射600分钟。在每个辐照期之后,在平板扫描仪上扫描胶片。图像被分为红色,绿色,蓝色分量,并且使用ImageJ版本1.44o图像分析软件存储红色图像。将直径为0.5英寸的感兴趣区域(ROI)放置在相减的全色薄膜图像的中心,并绘制UV照射持续时间和平均像素值的图表。 Gafchromic XR-RV3和XR-SP2均对UV-A有反应; UV-B的那些是中等的。但是,UV‐C与Gafchromic XR‐RV3和XR‐SP2的反应很少。根据这些结果,用UV-A辐照可能能够纠正不均匀性错误。可以对大面积的Gafchromic薄膜进行均匀的UV-A照射,并且在两次曝光技术中可以使用UV射线替代X-射线.PACS数:875.3亿

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