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Controllable Growth of Large–Size Crystalline MoS2 and Resist-Free Transfer Assisted with a Cu Thin Film

机译:铜薄膜辅助大尺寸晶体MoS2的可控生长和无抗蚀剂转移

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摘要

Two-dimensional MoS2 is a promising material for future nanoelectronics and optoelectronics. It has remained a great challenge to grow large-size crystalline and high surface coverage monolayer MoS2. In this work, we investigate the controllable growth of monolayer MoS2 evolving from triangular flakes to continuous thin films by optimizing the concentration of gaseous MoS2, which has been shown a both thermodynamic and kinetic growth factor. A single-crystal monolayer MoS2 larger than 300 μm was successfully grown by suppressing the nuclei density and supplying sufficient source. Furthermore, we present a facile process of transferring the centimeter scale MoS2 assisted with a copper thin film. Our results show the absence of observable residues or wrinkles after we transfer MoS2 from the growth substrates onto flat substrates using this technique, which can be further extended to transfer other two-dimensional layered materials.
机译:二维MoS2对于未来的纳米电子学和光电子学来说是一种有前途的材料。生长大尺寸晶体和高表面覆盖率的单层MoS2仍然是一个巨大的挑战。在这项工作中,我们通过优化气态MoS2的浓度研究了从三角形薄片到连续薄膜的单层MoS2的可控生长,这已被证明是热力学和动力学生长因子。通过抑制核密度并提供足够的源,成功地生长了大于300μm的单晶单层MoS2。此外,我们提出了一种在铜薄膜辅助下转移厘米级MoS2的简便方法。我们的结果表明,使用该技术将MoS2从生长基质转移到平坦基质上后,没有可观察到的残留物或皱纹,可以进一步扩展以转移其他二维分层材料。

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