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Preparation of CH3NH3PbI3 thin films with tens of micrometer scale at high temperature

机译:高温下数十微米级CH3NH3PbI3薄膜的制备

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摘要

The fabrication of high-quality organic-inorganic hybrid halide perovskite layers is the key prerequisite for the realization of high efficient photon energy harvest and electric energy conversion in their related solar cells. In this article, we report a novel fabrication technique of CH3NH3PbI3 layers based on high temperature chemical vapor reaction. CH3NH3PbI3 layers have been prepared by the reaction of PbI2 films which were deposited by pulsed laser deposition, with CH3NH3I vapor at various temperatures from 160 °C to 210 °C. X-ray diffraction patterns confirm the formation of pure phase, and photoluminescence spectra show the strong peak at around 760 nm. Scanning electron microscopy images confirm the significantly increased average grain size from nearly 1 μm at low reaction temperature of 160 °C to more than 10 μm at high reaction temperature of 200 °C. The solar cells were fabricated, and short-circuit current density of 15.75 mA/cm2, open-circuit voltage of 0.49 V and fill factor of 71.66% have been obtained.
机译:高质量有机-无机杂化卤化物钙钛矿层的制造是实现相关太阳能电池中高效光子能量收集和电能转换的关键前提。在本文中,我们报告了一种基于高温化学气相反应的CH3NH3PbI3层的新型制备技术。 CH3NH3PbI3层是通过在160°C至210°C的各种温度下通过脉冲激光沉积法沉积的PbI2膜与CH3NH3I蒸气反应制备的。 X射线衍射图证实了纯相的形成,并且光致发光光谱在760 nm附近显示出强峰。扫描电子显微镜图像证实平均晶粒尺寸显着增加,从160 C的低反应温度下的近1μm到200 C的高反应温度下的10μm以上。制备了太阳能电池,得到的短路电流密度为15.75 mA / cm 2 ,开路电压为0.49 V,填充系数为71.66%。

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